Static and Dynamic Analysis of Dental Implant Using Numerical Calculations

Objectives:  Numerical and mechanical simulations of stress distribution around implants were carried out to find out which material properties and types of implants would be optimal to reduce stress. Based on the numerical analysis using the finite element method, three types of tooth model were compared in their dynamic characteristics and static stresses.

The main goal of current study was to determine static stresses and dynamic characteristics of dental implant with different 3 material properties and their boundary conditions. This study deals with formulation of force distributions on the occlusal material using numerical approach and mechanics.

Methods:  In the evaluation of the shear and normal stresses of the dental implant including abutment, metal frame work, and occlusal material, classical force equilibrium equation has been used in this study. A two-dimensional plane elasticity model is employed to solve force-equilibrium equation. And, hexahedral and contact elements were used in the modeling of each dental implant.

Results: It is shown that large amount of compressive and shear forces are concentrated at the connection between the bone and lower part of the threads of the implant. Based on the numerical analysis using finite element method, the three types of implant model show 64MPa to 93Mpa in the maximum von Mises equivalent stress values. Also, there is an indication that there are high residual stresses, which deserves further research.

Conclusions: In this study, numerical calculations and finite element analysis were carried out for the evaluation of static and dynamic characteristics on the implant. The force transfer at the abutment-implant and implant-bone interface is an essential step in the overall analysis of loading, which determines the success or failure of an implant. Also it is shown that the effect of material properties of the implant, bone and their boundary conditions on the dynamic characteristics is considerable.